Molybdenum-tantalum sputtering targets for the most corrosion-resistant layers in displays

With its excellent adhesion to glass and its high electrical conductivity, molybdenum is a material that is widely used for electrode layers in thin-film transistors (TFT-LCD) and in tactile sensors (touch panels). These layers are subjected to humidity and corrosive media both during the manufacturing process and as a component of the display. Molybdenum-tantalum significantly improves the chemical resistance of these layers. The molybdenum-tantalum layer also has excellent wet-chemical structuring (etching) properties.

Your advantages at a glance:

High purity
> 99.97%
Maximum density
> 98%
Homogeneous microstructure and chemical composition

Download our product specifications:

MoTa sputtering target specification

Manufacturing molybdenum-tantalum targets

We are specialists in the powder metallurgical production of refractory metals. Our MoTa targets are produced through the careful mixing of the purest metal powder. The tantalum content in the target is defined according to the application in question and amounts to up to 11 percent by weight. The powder is then pressed, compressed evenly using our sintering equipment and subsequently formed into the target. We finalize our MoTa targets for use in our own bonding shops. Our MoTa targets therefore meet the most stringent quality requirements.

Maximum density – homogeneous microstructure

MoTa sputtering targets from Plansee are highly compressed by means of special forming processes. The advantage of this is that the PVD coating process guarantees homogeneous coating rates and improved coating properties. This results in improved efficiency and output in the production of thin films. Our powder metallurgical manufacturing process enables us to adjust the microstructure of the coating material to the specific application.

Maximum purity

Center of expertise for sputtering targets

Our targets fulfill the most stringent purity requirements. The main advantages: excellent electrical conductivity of the layer and minimum particle formation during the PVD process. Metal and non-metal impurities in the sputtering target are transferred to the sputtered functional layer, thereby impairing its function or causing particle formation in the PVD process (arcing effect). We guarantee that our MoTa targets are at least 99.97% pure.

Center of expertise for new coating solutions

In the PVD coating process, everything must be perfectly matched. It is only if all process parameters are perfectly matched that the layer that suits the customer's exact requirements can be produced. We carry out sputtering under practical conditions in our PVD application laboratory. Our developer team creates layers here and analyzes them in detail according to defined specifications. This means that new coating materials are developed in a very short time in cooperation with customers and numerous development partners. Having worked with system manufacturers and OEMs for several years, we are directly involved in the latest developments and optimizations.

The best proof of our expertise is us ourselves. We coat many of our products such as semiconductor base plates and rotating X-ray anodes in-house using the PVD, CVD, APS, and VPS coating processes.

Raw materials: everything from a reliable source

We have the entire value-added chain for our sputtering targets under one roof. From the raw material to the final product, we also develop new materials and optimize both coating processes and layers. Sintering is the central process in our powder metallurgical manufacturing process. We manufacture compact, metal products from porous powder blanks. We produce tungsten planar targets using the world's largest hot-rolling mill for refractory metals. Following the machining process, the sputtering targets are finalized ready for installation in our local bonding shops.

Our customers have been relying on Plansee as an independent private company for almost 100 years. Reliability and continuity are just as important to us as they are to you - especially when it comes to our raw material supply. With Global Tungsten & Powders (GTP) and our shareholding in Molibdenos y Metales (Molymet), the Plansee Group covers all of the steps involved in tungsten and molybdenum processing – from producing the powder to powder metallurgical processes, all the way through to the production of semifinished products and customer-specific components. And what's really important is that we procure our tantalum powder from certified conflict-free raw material sources.